We utilize magnetron sputtering to fabricate Non-Evaporable Getter (NEG) films. After activation, these films can maintain ultra-high vacuum (10-10 Torr) without pumps, with activation temperatures below 200 °C. Once activated, the getter films absorb residual gases in the vacuum system to achieve the desired vacuum level. Common residual gases include H2, H2O, CO, and CO2.

This technology uses advanced magnetron sputtering to fabricate NEG films with activation temperatures below 200 °C, achieving ultra-high vacuum (10-10 Torr) in a 1 meter long, 22 mm diameter chamber without pumps.

Non-evaporable getter (NEG) films are suitable for accelerators, MEMS, semiconductors, optoelectronics, and medical instruments. They replace vacuum pumps, enhancing system stability, with broad application potential and economic benefits.