Here we prepare a non-evaporative getter (NEG) film using magnetron sputtering. A vacuum chamber with a sputtered NEG film can maintain ultra-high vacuum (-10 Torr level) without any pump after activation. The activation temperature can be controlled below 200 °C according to different process conditions. The activated NEG film adsorbs residual gases in the vacuum system to achieve the UHV.

With continuous expansion of the application field of getter materialschanges in the application background. The research team has prepared an 1 m evacuated chamber straight tube with a long pipe diameter of 27 mm successfully,an ultra-high vacuum environment (-10 torr level) is achieved without vacuum pump after activation.

Since the non-evaporative getter (NEG) film is immune to the sizegeometry of chamber, it is often used in a narrow chamber in the accelerator. Further, in microelectromechanical system (MEMS), the conventional packaging is getting smaller due to technologies in recent years, so that the use of NEG film provides advantages for MEMS, which have small space occupancylarge gas absorption.