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Technical category
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    • 高質化石墨烯晶圓於下世代半導體之磊晶應用

      FutureTech 高質化石墨烯晶圓於下世代半導體之磊晶應用

      In this technique, it can synthesize high-qualitylarge area graphene. We develop batch to batch chemical vapor deposition (B2B-CVD) to reduce the cost to facilitate the industrialized production. At the same time, the development of high-quality six-inch graphene silicon wafers was made with our unique transferring process. The wafer can be used as epitaxial substrates, which can solve the bottleneck of poor heat dissipation of sapphire substrates, lattice mismatch of Si substrates,expensive SiCGaN substrates.
    • Atomic layer technologies for advanced materialsmodules

      Smart machinerynovel materials FutureTech Atomic layer technologies for advanced materialsmodules

      With rapid evolution of Moores lawsemiconductor technology nodes down to sub-10 nm, advanced devicematerial technologies capable of Å accuracy are highly demanded. Thus we developed atomic layer technologies including atomic layer deposition, atomic layer annealing, atomic layer epitaxy,atomic layer etching, etc. for extreme control of materialsstructures with Å precision.
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