Through the technique, SamplingPrediction of Lithography Overlay Errors, the costtime of overlay error measurement can be reduced to improve the process efficiency. We identify key sampling through clusteringmachine learning models,design a new sampling algorithm in photolithography process. Due to the complexity of wafermany training factors of wafer data, we combine the clustering algorithm with incremental learning to meet customers＇ unique needsachieve the goal of optimally samplingreducing the costs.

We constructed a model to differentiate different neurodegenerative diseases by using blood-based biomarkers. Linear Discriminant Analysis (LDA) was used to reduce dimensionsMICE (Multivariate Imputation by Chained Equations) was used for missing value treatmentchoose CART model to predict missing value imputation. This machine learning model would be used for early dectection of neurodegenerative diseases.

This technique combines deep learningdigital twin technologies to connect the designconstruction processto achieve construction-site rebar inspection, issue tracking, verificationmaintenance. This core component of this method is based on the image collection of rebar frames, digital twin creation, cooperative machine learning,the rebar inspection module development. The BIM model was automatically matchedcompared with the 4D digital twin with features of point cloudtime sequence.