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    • High Precision Maskless Lithography System for Advanced IC SubstratesPackaging

      Electronic & Optoelectronics Innotech Expo High Precision Maskless Lithography System for Advanced IC SubstratesPackaging

      This project develops a high-precision maskless lithography system consists of digital light processing, microlens / spatial filters arrays,precision servo-controlled motion technologies. Based on this maskless UV lithographic system, we are able to achieve UV patterning of arbitrarycomplicated 2D/3D microstructures for advanced IC substratepackaging.
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