A wavelength tunable micro-light-emitting diodes fabricated by the nanometer-level etching technology, the strain-induced engineering can effectively shift the emission wavelength from green to blue. Meanwhile, we introduced the ALD for the passivation layer,the super inkjet printing system used to form the color-conversion layer to emissive red light. Finally, a hybrid type full-color micro-LED has been fabricated with the monolithic epitaxial wafer.

This demonstration presents an active-matrix, 1920x1080, 370 nm UV MicroLED display. There are 2,073,600 pixels fabricated on this display which is smaller than a dollar coin,its diagonal has an extremely high pixel density of 3200 pixels per inch (ppi). The size of each pixel is 5 μm in diameter,the pixel pitch is 8 μm. The key technology of this achievement lies in the fabrication of pixels with good characteristicshigh uniformity,the successful development of flip-chip technology combining MicroLEDdriving integrated circuit pixels. This result can display imagesvideos.