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Technical category
    • Application of inorganic nanofiber technology to promote the development of biotechnology

      Smart machinerynovel materials FutureTech Application of inorganic nanofiber technology to promote the development of biotechnology

      Inorganic porous nanofibers with surfaceinterface defects are prepared through humidity-controlled electrospinninghigh-temperature annealing technology. Under the irradiation of light sources of different wavelengths (380~780 nm), the bound electrons stored in the valence band can be excited to the conduction band to form free electrons on the surface of the material, generating different intensities of microcurrents, light sensitivitymicrocurrent changes. Because the "inorganic nanofiber" technology has high uniquenesshigh product compatibility, it can be applied to a wide range of markets.
    • (test)Application of inorganic nanofiber technology to promote the development of biotechnology

      Smart machinerynovel materials FutureTech (test)Application of inorganic nanofiber technology to promote the development of biotechnology

      Inorganic porous nanofibers with surfaceinterface defects are prepared through humidity-controlled electrospinninghigh-temperature annealing technology. Under the irradiation of light sources of different wavelengths (380~780 nm), the bound electrons stored in the valence band can be excited to the conduction band to form free electrons on the surface of the material, generating different intensities of microcurrents, light sensitivitymicrocurrent changes. Because the "inorganic nanofiber" technology has high uniquenesshigh product compatibility, it can be applied to a wide range of markets.
    • Vacuum Functional Coating Technology

      Electronic & Optoelectronics FutureTech Vacuum Functional Coating Technology

      Here we prepare a non-evaporative getter (NEG) film using magnetron sputtering. A vacuum chamber with a sputtered NEG film can maintain ultra-high vacuum (-10 Torr level) without any pump after activation. The activation temperature can be controlled below 200 °C according to different process conditions. The activated NEG film adsorbs residual gases in the vacuum system to achieve the UHV.
    • Thermoelectric Ever-Charge Portable Charger

      Smart machinerynovel materials FutureTech Thermoelectric Ever-Charge Portable Charger

      This technology develop a “Thermoelectric Ever-Charge Portable Charger” for the applications in auxiliary charging of consumer electronicsfast self-charging for outdoor sensors. Technically, a sputtering depositiona semiconductor photolithography technique are combined to fabricate p-n materialsconnection procedures. The thermoelectric performance of the device is further optimized through a low-temperature heat treatment.
    • 應用於可見光網路通訊之多組態光感測記憶體

      FutureTech 應用於可見光網路通訊之多組態光感測記憶體

      "Visible Light Communication (VLC)" is the best candidate for the next generation of network communication owing to its wide bandwidthscompatibility with solid-state lighting devices. Our proposed technology features a novel multilevel photosensing memory which can integrate the photosensing, memorycomputation components for VLC into one device. This device is based on a thin film transistor, where the oxide semiconductor is added with gold nanoparticles to form a "co-active layer" in order to expand the visible light sensing spectrumefficiently convert the light signal into a current signal. It not only simplifies the production processreduces the cost, but also accelerates the signal transmission speed, which further advances the future mobile comm
    • MethodStructure of stacking 3D-IC Employing Controlled-Grain Semiconductor Film

      Electronic & Optoelectronics FutureTech MethodStructure of stacking 3D-IC Employing Controlled-Grain Semiconductor Film

      The location of controlled-grain Si island is determined by the pattern of “cooling holes”. The grain size is determined by the distance between “holes” due to lateral grain growth using pulse laser crystallization. This predictability allows the transistorscircuits to stay away from the grain boundaries for monolithic
    • Atomic layer technologies for advanced materialsmodules

      Smart machinerynovel materials FutureTech Atomic layer technologies for advanced materialsmodules

      With rapid evolution of Moores lawsemiconductor technology nodes down to sub-10 nm, advanced devicematerial technologies capable of Å accuracy are highly demanded. Thus we developed atomic layer technologies including atomic layer deposition, atomic layer annealing, atomic layer epitaxy,atomic layer etching, etc. for extreme control of materialsstructures with Å precision.