The DNN models of this technology include a LithoNet, an OPCNet,a layout novelty detection network. LithoNet is a learning-based pre-simulation model for layout-to-SEM contour prediction,OPCnet is a dual network of LithoNet for photomask optimization. Integrated with a well-trained LithoNet, our layout novelty detection network, consisting of a self-attention guided LithoNetan autoencoder, can check if there are layout patterns easily resulting in local distortions in contours of metal lines based on multi-modal (global-local) feature fusion.